Abstract: - A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without the use of a very expensive synchrotron source needed to expose the photoresist layer in X-ray LIGA. SU-8 photoresist appeared to be well-suited for LIGA templates, but also as a permanent material. , the UV-LIGA production procedure and the processing parameters on fabrication of micro gear were determined through manufacturing experiments. The involute profile micro gear samples and the cases were fabricated based on UV-LIGA technology. The micro gears with parameters of modular m=0.04mm, tooth number z =18 was made of Nickel. The size, elastic modulus and the indentation hardness of the micro gear were measured. The results indicate that the structure of the micro gear is clear, the surface and the curve of tooth profile are smooth, and the sidewall is vertical. Micro gear transmission device was assembled by micro gear and micro case, and it can transmit continuously. The work provided some reference for the fabrication of micro gear transmission device.

Keywords: - Micro gear, UV-LIGA technology, Fabrication, Involute profile, SU-8, thick photoresist, micro-components, high aspect ratio.

| DOI: 10.17148/IARJSET.2022.9433