Abstract. The Optimizing Envelope Method (OEM) for thin film characterization has been based on minimization of an Error Metric (ERM) related to the film thickness or/and the interference order numbers of the extrema in the interference pattern of transmittance spectrum T(λ) of the film on glass substrate specimen. It has been indicated that the OEM has a capacity for providing most accurate characterization of almost every dielectric or semiconductor film with average thickness of [300,5000] nm, only from T(λ), compared to all the other methods for characterization of such films only from T(λ). However, there was no comprehensive analysis of which ERM is best for the OEM. In the presented paper is studied the performance of seven ERMs. An approach based on using grouped bar charts is proposed for selection of the ERM providing the most accurate possible thin film characterization by the OEM, depending on the appearance of T(λ).

Keywords: best error metric, selection, optimizing envelope method, thin film, optical characterization

| DOI: 10.17148/IARJSET.2020.7301